Plasma Monitor PM-KJ001
Plasma monitor
For process management, leak management, and endpoint detection!
- Company:魁半導体
- Price:Other
1~3 item / All 3 items
Plasma monitor
For process management, leak management, and endpoint detection!
Suitable for plasma monitoring such as etching, sputtering, and CVD!
The compact spectrometer manufactured by Ocean Optics is chosen by many customers to acquire the plasma emission spectrum in real-time within the chamber. Monitoring the plasma characteristics derived from these emission spectra is suitable for plasma-based process control in semiconductor manufacturing, among other applications. The "Plasma Monitor" can be configured with spectrometers and related accessories, including the standard model FLAME, the high-resolution model HR4000, or the buffering-compatible UV high-sensitivity model OCEAN HDX. It also supports mass production and custom applications, such as integration into semiconductor manufacturing equipment. 【Features】 ■ Supports wideband spectrum measurement ■ High wavelength resolution ■ Easy connection via optical fiber ■ User-friendly software OPwave+ (customizable) *For more details, please refer to the PDF materials or feel free to contact us.
For process management, leak verification, and endpoint detection!
This product monitors the plasma's emission colors using only the three RGB colors and is designed for operation and logging on the customer's computer, achieving the following with high cost performance: - Process management - Leak confirmation - Endpoint